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Dip-pen Nanolithography

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Current state of the art photolithography tools use deep ultraviolet light with wave lengths of 248 and 193 nm, which allow minimum feature sizes down to 50 nm. – PowerPoint PPT presentation

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Title: Dip-pen Nanolithography


1
Dip-pen Nanolithography
  • Yu Shi
  • Dept. of Materials Science Engineering

2
From microscopy to lithography
Scanning probe microscope
electron microscope
optical microscope
?
photolithography
E-beam lithography
10-6m
10-7m
10-8m
10-9m
10-10m
10-5m
10-11m
If you can see, then you should be able to write
3
History and origin
4,000 years ago Invention of
AFM in 1986
1995 by Jaschke Butt
1999
Butt et al. Langmuir 11, 1061 (1995). Mirkin et
al. Science 283, 661 (1999).
4
Principle
Source http//www.nanoink.net
5
Principle
Mirkin et al. Science 283, 661 (1999).
6
Extended capabilities I
Mirkin et al. Nature Nanotechnology 2, 145 (2007).
7
Extended Capabilities II
55,000 cantilevers and 88,000,000 gold dots!
Mirkin et al. Nature Nanotechnology 2, 145 (2007).
8
Compare contrast
Source http//www.nanoink.net
9
Thank you!
  • Q A

10
Chemistry I
11
Chemistry II
12
Idea from Mirkin
  • DPN is finding applications in certain areas
    that impact the semiconductor industry such as
    mask fabrication, inspection and repair
  • However, its unique attributes have positioned
    it on a different path aimed largely at
    exploiting the properties and applications of
    nanopatterned soft materials
  • -- C. A.
    Mirkin (2007)

Mirkin et al. Nature Nanotechnology 2, 145 (2007).
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