Title: An Introduction to Dip-Pen Nanolithography
1An Introduction to Dip-Pen Nanolithography
2What is DPN?
- Direct-write patterning technique based on AFM
scanning probe technology - AFM tip is coated with ink and used to write on
surface - Very reliable bottom-up process (ink deposition
rate can be precisely controlled)
Baselt, David. California Institute of
Technology. 1993. Images obtained at
lthttp//stm2.nrl.navy.mil/how-afm/how-afm.htmlgt
3What is DPN? (continued)
- Compatible with both hard and soft matter on
lengthscales below 100 nm - Capable of depositing arrays of biomolecules on
various materials (metals, semiconductors,
functionalized surfaces) - Biomolecules can be directly deposited on the
surface in ambient temperature, no exposure to
etchants, electron beams, or radiation
4Advantages of DPN
- Resolution - 15nm
- Direct write so only where you want and what you
want - Based on AFM - can write and see
- Ambient conditions
- Image from J. Haaheim et al. Ultramicroscopy 103
(2005) 122
5Advantages continued
- More than one layer
- Can work with multiple inks at once
- Organic and inorganic inks
- Bottom-up and top-down
6Ink Theory
- Inks small organic molecules, organic and
biological polymers, colloidal particles, metals
ions
C. A. Mirkin et al, Angew. Chem. Int. Ed. 2004,
32.
7Ink Theory (continued)
- Ink-substrate combinations
- Tip-substrate molecular transport
- Chemical makeup and purity (ink and surface)
- Shape of tip
- Distribution of ink on tip
- Temperature
- Humidity of surroundings
- Solubility of ink
8Ink Theory (continued)
- Water meniscus from ambient moisture
- Humidity controlled box
Modeled after the diagram in R.D. Piner, J. Zhu,
F. Xu, S. H. Hong, C. A. Mirkin, Science 1999,
283, 661.
9Current Applications
- DPN is specially advantageous to biomolecular
manipulation - DNA and protein arrays are being fabricated as
detection chips - DPN resolution is four to five orders of
magnitude greater than other lithographic
techniques ultra-high density nanoarrays
Image courtesy of Oak Ridge National Laboratory.
Obtained at lthttp//homer.hsr.ornl.gov/CBPS/Array
technology/ZFChipSM.jpggt
10Obstacles
- Most are currently being addressed
- Speed
- Matching inks to substrates, correct conditions
- Smooth surfaces to work on
- Turning the write head on/off at will
11Future Applications
- Parallel arrays
- Passive probe array
- Duplicate a pattern multiple times
- Independent control of each probe tip
- Create complex arrays at high speeds
- Automated tip coating and ink delivery
- Microfluidic technology possible ink wells for
dipping of probe tip
12Sources
- C. A. Mirkin et al, Angew. Chem. Int. Ed. 2004,
43, 30-45. - Baselt, David. California Institute of
Technology. 1993. Images obtained at
http//stm2.nrl.navy.mil/how-afm/how-afm.html - J. Haaheim et al. Ultramicroscopy 103 (2005) 122
- Gerding, J. D. et al. Journal of American
Chemical Soc. 2005 127. 1106-1107. - R.D. Piner, J. Zhu, F. Xu, S. H. Hong, C. A.
Mirkin, Science 1999, 283, 661. - Oak Ridge National Laboratory. http//homer.hsr.or
nl.gov/CBPS/Arraytechnology/