Title: Sources and Beam Lines of Canadian Light Source
1Sources and Beam Lines of Canadian Light Source
Emil Hallin Canadian Light Source (material
organized and presented by D.T. Jiang)
2First Phase CLS Beamlines
- 7 beam lines are funded and approved by the
- CLS Facility Advisory Committee
- (Facility Diagnostic Line 1 BM, visible light)
- Far IR (BM)
- Mid IR Spectromicroscopy (BM)
- Soft X-ray Spectromicroscopy (Elliptical
Undulator) - SGM (Undulator)
- VLS-PGM (Undulator)
- Protein Crystallography (Small Gap in-vacuum U)
- Hard X-ray microXAFS (Wiggler, Ec10.7keV)
3Main Hall Floor plan
4Mezzanine Level
Expansion Zone - Beamlines
Offices Labs
Office Reserve
Lab Reserve
5High Resolution Far IR Spectroscopy
- PI Bob McKellar Robert.Mckellar_at_nrc.ca
- Wavelength range 10-200 mm, 0.006-0.13 eV,
50-1000 cm-1 - Resolution lt 0.001 cm-1
- Endstation
- High resolution Fourier Transform spectrometer
- Sensitive FIR detectors liquid He cooled
- Gas Phase work
- Coolable long-path cell
- Multi-pass electric discharge cell
- High temperature absorption cell
- Supersonic jet expansion chamber
- High pressure diamond anvil cell, focusing
optics, bench alignment tools - Surface interface studies UHV chamber, sample
preparation and manipulation, 100 mm spot size
6Mid IR Spectromicroscopy
- Mike Jackson mike.jackson_at_nrc.ca
- Wavelength 1.5-15 mm, 0.08-0.8 eV, 700-6000 cm-1
- Spatial resolution lt 5 mm
7IR Beamlines
8First Mirror Concept
902B1.1 Mid IR Schematic
1002B1.1 Mid IR Floor Layout
1101B1.1 Far IR Schematic
1201B1.1 Far IR Floor Layout
13Brightness 100 mA
14Soft X-ray Spectromicroscopy
- PI Adam Hitchcock aph_at_mcmaster.ca
- Wavelength 6-60 Angstrom, 250-1900 eV
- Insertion device EPU (AppleII, ESRF termination)
- Infinity corrected entrance slitless PGM with
vertical dispersion plane - Optics grating (SX700 style) zone plate
- Resolution 3000 or better
- Endstation STXM PEEM
15SM Optical Layout
Feature XES
177o
M1
6o
PGM
177o
M2 G(1-3)
exit slit
M3 STXM
16.2 (15.0)
1.5
EPU
6
3
5
STXM
1.5
M3 PEEM
6o
3
exit slit
M4 PEEM
3
177o
1
PEEM
16SM Optical Description
- Variable polarization arbitrary linear
150-2000eV, circular- 100-1000eV - Infinity corrected PGM STXM at long arm branch
(preserved brightness), - PEEM (exchangeable) on short (preserve flux)
- Nominal energy resolving power 3000, may be
increased till 7000 - Intensity on sample STXM-108ph/s at 40nm,
PEEM-1012ph/s in f40m - Stable operation even for CLS 2005 e-beam
parameters
17SGM and VLS PGM
- PI T.K. Sham sham_at_uwo.ca
- SGM Wavelengths 200 1900 eV
- PGM Wavelengths 5.5 250 eV
- SGM Resolution 3000
- PGM Resolution 10000
- Optics grating monochromator
- Endstations UHV
- Capabilities photoemission, XAFS
- Both preliminary design reports are complete
18Insertion Devices
- SGM- 44 mm PPM device 1.2 m long
- PGM- 185 mm PPM device 1.8 m longÂ
- 1.25 mrad total canting between devicesÂ
- Preliminary designs for both devices complete
19Protein Crystallography
- PI Louis Delbaere Louis.Delbaere_at_usask.ca
- Wavelengths 1.9 0.68 Angstrom, 6.5 18 keV
- Resolution 1.6 x 104 using Si(220)
- Typical Crystal size 20 50 mm
- Design goal flux of 1013 photons/sec into a 50 x
100 mm area - Design will be modeled after beamlines at SBC-CAT
and SER-CAT (APS). Preliminary design is almost
complete.
20Protein Crystallography Beamline Layout
(Based on the Design of SER-CAT/APS)
21Small Gap Undulator Brilliance
Per 4.5 cm, N26 (L1.19m), B00.843T, Kmax3.54
22Micro-XAFS
PI De-Tong Jiang jiang_at_usask.ca
Superconducting Wiggler Parameters lm 0.033
m Magnet Period Length N 35.5 Number of
Periods B 1.9 T Magnetic Field K 5.91 K
Parameter  Front End Aperture 1 mrad (H) x
0.24 mrad (V) Â Ray-tracing shows that the XAFS
focus is 1050 m horizontal (FWHM) x 257 m
vertical (FWHM) in size. The Kirkpatrick-Baez
mirror pair reduces this down to 14-19 m
horizontal (FWHM) x 6-9 m vertical (FWHM),
using bent elliptical cylinders. Â
23Wiggler Brilliance
DTJ Note This is from the first hybrid design
concept, total power SR there would have been 23
kW. Gave up and switched to Superconducting
design. The new design is at least another
factor of 2 better yet half the total SR power.
Smaller SR horizontal fan of course.
24Flux at Sample (Shadow tracing)
25Micro-XAFS photon flux
26Summary of CLS BL Status
- First 7 lines scheduled operation time Jan. 2004
-
- Preliminary designs for most of the first 7 lines
are complete - Tendering process has been started on beamline
and endstation - Instrumentation
- Phase I Insertion device preliminary designs are
completed - Front ends conceptual design completed
27CLS Design Parameters
Circumference m 170.88
Periodicity 12
Optics nx (tune) ny cx (natural chromaticity) cy Momentum compaction 10.22 3.26 -13.9 -17.7 0.0038
Straights center center Number Length bx (betatron) by d (dispersion) m m m m 12 5.2 8.5 4.6 0.15
RF Frequency Total voltage MHz MV 500 2.5
E (energy) GeV 2.9
Bdipole T 1.354
Damping times tx ty tz ms ms ms 2.4 3.8 2.7
E-loss/turn MeV 0.876
Dipoles Total Rad. SR Power kW_at_500mA 438
Dipoles Rad. SR Power per meter kW/m 9.76
ex (emittance) nm-rad 17.8
d (energy spread) 0.11
Bunch length (full) ps 54
28CLS Reference Specifications
29CLS Source Point Sizes and Machine Functions
30Bending Magnet Brilliance
31Bending Magnet Total Flux
32Wiggler Total Flux
33Small Gap Undulator Flux
34Cell 6 Block diagram layout
- Cell 6 includes the following beamlines, none of
which are as yet approved - Hard X-ray Microprobe
- Powder diffraction
- CSRF DCM replacement
35Cell 6 Elevation concept layout
36Cell 7 Block diagram layout
37Cell 7 Elevation concept (XAFS Center line)
38Cell 7 Elevation concept (Sidestation)
39FLUX 100 mA
40SM AutoCAD layout
- EPU (conceptual design is issued, no significant
influence on machine) - Front End (Duplex, conceptual design is issued)
- Following ALS co-development M1 mirror
(Glidcop), PGM, Mirror manipulator for M1-M4
eng. drawings and part order spec. Vacuum
chambers and supports for mirrors need to be
designed. - PEEM (ordered, summer 2002), STXM (engineering
design due to April 02) - Exit slits, vacuum equipment, electronics,
maintenance/ commissioning equipment- commercial
41Heat load estimation for CSRF SGM at the CLS
42Progress Report (11B1.1) Medium Energy X-ray
Facility Beamline (DCM)
- Updated Calculations
1. Photon flux curves
2. Resolution curves
InSb(111),Si(111) 3.
Resolution from SHADOW - Design specification has been written
Engineering Request for Finite Element Analysis
(FEA)/Design of Double Crystal Monochromator
beamline crystal cages
Submitted to CLS
Engineering (Dan Lowe).
Possible Outsourcing
1. Instrument
Design Technology 2. Physical
Sciences Laboratory 3. Advanced
Design Consulting, Inc. 4. Oxford Danfysik - Preliminary design report is still being written.
October, 2001? Overlap with Lijun Lu
43Photon Flux on sample
The theoretical photon flux (photons/second) on
sample for a 500 mA beam at the Canadian Light
Source in 2008. InSb(111) crystals were used in
the calculation from 1750-3700 eV, while Si(111)
crystals were used above this photon energy.
Below 2100 eV the harmonic filter mirror (M5)
was in place, while above this photon energy it
was assumed to be moved out. The two curves
illustrate the expected photon flux on sample
for the conditions of the carbon filter being
in place, then out.
44Theoretical resolution (FWHM) and
s-polarization peak reflectivity for Si(111)
and InSb(111) crystals
The theoretical DCM resolution (FWHM) and
s-polarization peak reflectivity for Si(111)
and InSb(111) crystals in parallel orientation
(,-) versus photon energy. The calculated
resolutions and reflectivities are based on the
combination of both crystals in this
configuration.
45Comparison of resolution at the experimental
focus SHADOW versus XCrystal (XOP)
Comparison of the resolution at the experimental
focus calculated by SHADOW using a continuous
photon energy input, with that from XCrystal
(XOP), for 1840 eV. InSb(111) crystals were
used in parallel orientation (,-) for the
calculations.
46Protein Crystallography Endstation