1977??????Tuomo Suntola????,?????????????ZnS???

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• 1977??????Tuomo Suntola????,?????????????ZnS???
• 20??90??????,ALD???????????????,???????High-K??,?
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• ALD( Atomic Layer Deposition)???????????????,????
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• ?400?????,???????????

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Outline
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ALD???????
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TiO2
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• ALD????(???)???
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?ALD?????
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PEALD(Plasma Enhanced ALD)
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High-k????
EOT(Equivalent Oxide Thickness) ???????
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Cu????
??55um,??0.475um,?????1001!
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DRAM
DRAM???????????????
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1. Antti Rahtu, Atomic Layer Deposition of High
   Permittivity OxidesFilm Growth and In Situ
   Studies,2002
2. Markku Leskela, Mikko Ritala, Atomic layer
   deposition (ALD) from precursors to thin film
   structures, Thin Solid Films ,138-146,2002
3. Riikka L. Puurunen, Surface chemistry of atomic
   layer deposition a case study for the
   trimethylaluminum/water process,2005
4. ???,???, ???,????????????,????????,?125?,2005
5. ??,???,???,?????????????????,??,?43??4?,2006
6. Steven M. George,Atomic Layer Deposition An
   Overview, Chemical Reviews, Vol. 110,2010

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Thanks