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MOSFET Transistors

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... the threshold voltage to invert the surface of a p well to create a n channel is: ... VG = VFB is the flat band capacitance CFB ... – PowerPoint PPT presentation

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Title: MOSFET Transistors


1
MOSFET Transistors
  • Wk 11

2
MOSFET Energy Band Diagram
  • The MOSFET energy band diagram combines the work
    function of the metal and the semiconductor work
    function and a gate voltage that must be applied
    for no electric field in the SiO2 Silicon Dioxide
    gate insulator. This voltage is referred to as
    the Flat band voltage.
  • If there is surface charge /cm2 in the oxide
    silicon interface an addition term is present in
    VFB.

3
MOSFET Energy Band Diagram 2
  • Expressing the semiconductor work function ?s in
    terms of the electron affinity ?, Eg/2, and the
    doping for an p well the flat band voltage is
  • For a n well the flat band voltage is

4
MOSFET Oxide Capacitance COX n channel surface
inversion condition
  • COX the oxide capacitance per unit area is
  • The surface is considered inverted forming a n
    channel in an p well if the Fermi level goes from
    Ei-EF to Fn-Ei where Ei-EF Fn-Ei ?F the
    inversion potential is then 2 ?F where ?F is

5
n channel depletion region for 2?F
  • To invert the surface to form an n channel in a p
    well we start from the flat band voltage and
    apply the needed 2?F. This implies a depletion
    region from Poissons equation of W
  • Associated with the depletion region is a total
    immobile negative charge per unit area Qd

6
n channel VG at inversion
  • Starting from the flat band voltage VFB to invert
    the surface requires 2?F creating a depletion W
    with charge QD that creates an Electric Field in
    the Silicon dioxide requiring additional gate
    voltage given by
  • The gate voltage, the threshold voltage to invert
    the surface of a p well to create a n channel is

7
p channel VG at inversion
  • For a p channel in an n well inversion requires
    -2?F where ?F is
  • Associated with the depletion region is a total
    immobile positive charge ND resulting in the VG
    threshold equation

8
CGate capacitance two terminal model gate to
substrate contact
  • The gate to substrate capacitance is often
    monitored in MOS production for process control.
    Monitors have large area to allow capacitance
    meter measurement.
  • The gate to substrate capacitance for strong
    inversion at low frequency or the opposite
    condition of accumulation is just COX and allows
    TOX measurement for a given area capacitor.

9
CGate capacitance two terminal model gate to
substrate contact 2
  • For gate voltages in the transition range where
    the device is between accumulation and strong
    inversion and for strong inversion at high
    frequency (no thermally generated mobile
    accumulation charge available) the gate to
    substrate capacitance is the depletion
    capacitance in series with the oxide capacitance

10
The gate to substrate capacitance when VG VFB
is the flat band capacitance CFB
  • When the gate voltage is equal to the flat band
    voltage the majority charge variation has
    associated with if a length called the extrinsic
    (doped) Debye length
  • Associated with the Debye length is a Debye
    capacitance CDebye. The flat band capacitance CFB
    is CDebye in series with COX
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