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Spin Electronics

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C. go into S in a Cooper pair. A and B. B and C. C and A. A and B and C. N. S ... in-between. p = 0. Comparison: normal metal and ferromagnet. V. Elshan Akhadov ... – PowerPoint PPT presentation

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Title: Spin Electronics


1
Spin Electronics
Peng Xiong
Department of Physics and MARTECH Florida State
University
QuarkNet, June 28, 2002
2
Moores Law is the end in sight?
  • Speed 100 Hz
  • Size 10-2 m
  • Cost 106/transistor
  • Speed 109 Hz
  • Size 10-7 m
  • Cost 10-5/transistor

3
Magnetic Information Storage superparamagnetic
limit
  • Density 20 Gb/in2
  • Speed 200 Mb/s
  • Size f2.5 x 2
  • Capacity 50 Gb
  • Density 2 kb/in2
  • Speed 70 kb/s
  • Size f24 x 50
  • Capacity 5 Mb

4
Superparamagnetic Limit thermal stability of
magnetic media
5
Semiconductor Random Access Memory alternatives?
M
O
S
  • High speed
  • Low density
  • High power consumption
  • Volatile

6
Metal-based Spintronics Spin valve and magnetic
tunnel junction
Applications magnetic sensors, MRAM, NV-logic
7
Spintronics in Semiconductor spin transistor
  • Dreams
  • High performance
  • opto-electronics
  • Single-chip computer
  • (instant on low power)
  • Quantum computation

Datta and Das, APL, 1990
H
SOURCE
DRAIN
GaAs
  • Issues
  • Spin polarized material
  • Spin injection
  • Spin coherence
  • Spin detection

H
8
Spin Injection the conductivity mismatch
I
Schmidt et.al., PRB, 2000
I
RN
RF
I
SC
mF
RN
RF
mN
mF
mN
FM
9
Measurement of spin polarization using a
superconductor
10
Andreev reflection normal metal/superconductor
E
S
N
D
eV
EF
-D
N(E)
N
S
11
Andreev reflection normal metal/superconductor
p 0
Z 0 clean metallic contact
Z gtgt 1 tunnel junction
Z 1 in-between
Blonder, Tinkham, and Klapwijk, PRB, 1982
12
Andreev reflection ferromagnet/superconductor
p 75
E
F
S
Z 0 metallic contact
D
eV
EF
-D
Z 1 in-between
DOS
Z gtgt 1 tunnel junction
V
13
Comparison normal metal and ferromagnet
p 75
p 0
Z 0 metallic contact
Z 0 metallic contact
Z 1 in-between
Z 1 in-between
Z gtgt 1 tunnel junction
Z gtgt 1 tunnel junction
V
V
14
Spin Polarization of CrO2 our approach
  • Planar junction ? real device structure
  • Artificial barrier ? controlled interface
  • Preservation of spin polarization
  • at and across barrier

Key step controlled surface modification of
CrO2 via Br etch
15
CrO2 Film Growth Chemical Vapor Deposition
Furnace, T280 C
O2 flow
Heater block, T400C
substrate
Cr8O21 precursor
Ivanov, Watts, and Lind, JAP, 2001
16
Junction Fabrication and Measurement
  • Grow CrO2 film
  • Pattern CrO2 stripe
  • Surface modification Br etch
  • Deposit S cross stripes

Pb or Al
Pb or Al
I
CrO2
CrO2
TiO2
17
Results CrO2/(I)/Pb junctions
Metallic contact Z 0 p 97
  • T 1.2 K
  • 1.44 meV

Tunnel junction
T 400 mK
High quality barrier w/o inelastic scattering
18
Measurement of spin polarization in high-Z
junctions using Zeeman splitting
E
D
eV
EF
-D
eV/D
N(E)
Meservey and Tedrow, Phys. Rep., 1994
S
F
19
Zeeman splitting in an F/I/S junction
CrO2
  • In order to get high Hc
  • Ultrathin S film
  • Parallel field
  • Negligible s-o interaction

H
Al
Al
CrO2
20
Results Zeeman splitting
2.5T
-2.5T
T 400 mK
21
  • Summary (CrO2)
  • Verified half-metallicity of CrO2
  • Engineered an artificial barrier on CrO2 surface
  • Preserved complete spin polarization at
    interface
  • Achieved full spin injection from a half metal
  • Future
  • Apply the technique to other systems
  • Magnetic tunnel junction

22
CrO2/I/Co magnetic tunnel junction
H
Co
CrO2
AlOx
23
The People
Jeff Parker Jazcek Braden Steve Watts Pavel Ivanov
Stephan von Molnár Pedro Schlottmann David Lind
24
Lets build
computers with wires no wider than 100 atoms, a
microscope that could view individual atoms,
machines that could manipulate atoms 1 by 1, and
circuits involving quantized energy levels or the
interactions of quantized spins.
Richard Feynman Theres Plenty of Room at
the Bottom 1959 APS Meeting
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