JRA SOIPassive

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JRA SOI-Passive

• Coordinator Peter I. Borel (pib_at_com.dtu.dk)
• Deputy Coordinator Jacob Fage-Pedersen
  (fage_at_com.dtu.dk)
• Group COM/Hvam

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New activity JRA SOI-Passive
Passive nano- and micro-photonic SOI circuits
Relations to JRA1 and FAA3
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New activity Synergies

• Platform connections
• Silicon Photonics Platform
• Nanostructuring Technologies for Photonic
  Integration
• Modelling Platform
• Inter-JRA connections
• JRA NIL (Andrea Fuchs)
• JRA FIB (Ferydun Ay Wico Hopman)
• JRA PhC infiltration (Nicolas Le Thomas)
• JRA SOI-Modulator (Pablo Sanchis)
• JRA SOI nonlinear (Michael Först)

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Research Activity

• Aim push the performance limits for passive SOI
  structures
• PhCW, PWs, slow-light structures, high-Q
  cavities, AWGs, WDMs...
• Joint design, modelling, fabrication and
  characterisation efforts
• Sidewall roughness estimation
• Synergy and eliminate double efforts

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Research Activity
Benchmark EBL, DUV, NIL and FIB
JRA NIL poster
NIL structures fabricated at MIC and COMDTU
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New research targets

• Research goals
• Ultra low-loss PhCWs and photonic wire
  structures
• PhC structures with low loss in the slow-light
  regime
• High-Q cavities
• Compact wavelength selective components PhC/PW
• Photonic structures with non-regular/chirped
  unit cells,
• Waveguide transitions and injectors,
• PhC structures with high filling factors for TM
  PBG
• PW Bragg grating structures including coupled
  cavity formats with slowing for the group
  velocity

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New integration targets

• Integration Targets of the new activity
• Junior and senior exchanges
• Inter-JRA exchanges
• Compare, document and share optimised
• fabrication procedures
• Joint publications
• Future collaborations

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Partners and structure

• COMDTU/Hvam Coordinates JRA SOI-passive
• FDTD, TopOpt, Proxecco, EBL, ICP, SEM, AFM, end
  fire, PhC, PW, slow light
• IMEC SOI platform coordinator
• DUV, design library, fibre couplers, end fire,
  PW, AWG
• StA Nano platform coordinator
• EBL, Si and SiO2 etch, PhC membranes, slow
  light
• UPVLC-NTC
• FDTD, PWE, EBL, etch, AFM, PhC, PW, slow light,
  high Q
• ETHZ
• NanoPECS, EBL, end fire, TM PBG
• AMO
• Proxecco, EBL, supercritical resist drying,
  ICP, NIL, PW, PhC
• KTH
• FDTD, AOI, PECVD, EBL, dry etching, end fire,
  PhC, PW, slow light, high Q
• GLASGHU
• Proxecco, EBL, resist treatment, dry etching,
  smoothing