Pr

1
(No Transcript)
2

• CHEMICAL VAPOR DEPOSITION (CVD)
• A process of formation of a non-volatile solid
  film on a substrate from the reaction of vapor
  phase chemical reactants containing the right
  proportion of constituents.
• ELEMETRY STEPS IN CVD
• Introduction of reactive species into a reactor
• Diffusion and Adsorption of the reactants onto
  the surface
• Reaction at the surface to form the solid
• Desorption of by products from the surface
• Diffusion of by products and un-reacted
  reactants away from the surface and transport of
  by products out of the reactor

3
Deposition rate is determined by rate limiting
step
Effluents out of the reactor
Effluents out of the reactor
Substrate
H2S (g) Zn (g) ZnS (s) H2 (g) ,
Adsorption reaction
Zn
H
H
Diffusion of by-products
Diffusion of by-products
Zn Ar
H2S Ar
H
H2S Ar
H2S Ar
Diffusion of the reactants
Diffusion of the reactants
H2S Ar
H2S Ar
H2S Ar
Zn
Zn
Reactive species into a reactor
Zn Ar
H2S Ar
4
CONTROL OF ELEMENTARY STEPS
Chemical Reactions Reactor Type and Geometry
Process parameters (Temperature, Pressure, Flow
rate and time)
Transport phenomena (Mass and Heat)
Kinetics and Thermodynamics Hence , CVD
technique combines several scientific and
engineering disciplines
5
CVD Reactor Types
CVD Type Advantageous Disadvantages
APCVD 100 mbar -1000 mbar Simple, Fast, Low temperature Contamination Non uniformity
LPCVD 1 mbar 30 mbar Purity, Uniformity Slower , Vacuum, High Temperature
PECVD 1 mbar 10 mbar 100kHz to 2.45 GHz Fast, Low temp. Contamination Cost
Laser Induced CVD Metal-organic CVD Plasma Assisted CVD High Density CVD Vapor Phase Epitaxy Atomic Layer Deposition L-CVD MOCVD PACVD HDCVD VPE ALCVDD L-CVD MOCVD PACVD HDCVD VPE ALCVDD
Cold wall CVD Only substrate heating by
Inductive heating( RF, eddy) , Optical heating
(lamp) , Resistive heating ( suceptor) Adv/Disad
v. No deposition in chamber walls but temp.
monitoring and uniformity are issues. Hot Wall
CVD Heat entire system and generally used.
6
TYPICAL CVD REACTIONS
Example CH4 TiCl4 ? TIC 4HCl BCl3
NH3 ? BN 3HCl SIH4 NH3 ? Si3N4 H2
CH3Cl3Si H2 ? SiC 3HCl Mastering the process
chemical reaction by the mastering the technology
7
MPA Industrie expertizes

• Design and construction of customized turn key
  CVD reactors.
• Chemical and physical engineering of reactor
• Special gas handling ( toxic, corosive,
  explosible)
• Liquid source handling (storage and dosing)
  specialist
• Solid source development high temperature
  chlorination of metal
• Vacuum technic and effluent trapping
• Process control

8
SPECIAL GAS AND LIQUID SOURCE HANDLING
9
Reactor design whatever the size Temperature up
to 2200C RF, DC, MW plasmas
10
Vacuum techniques applied to CVD processes Dry
and wet scrubbing stations
11
PROCESS CONTROL
12
FULL OFFER

• Hazardous analysis
• Chemical field knowledge
• Nuclear field knowledge
• CVD consultancy
• CAD departement

13
LARGE FIELD OF ACTION FROM LABORATORY SCALE TO
INDUSTRIAL SCALE

14

• Process mastering
• Thermodynamic
• Reactor geometry
• Caracterization ( X, MEB,Transmission IF

15
Example metallurgy Coated Hard metal for
machining Coated steel for steel forming Target
is hardness, low friction coefficient, thermal
resistance Materials TiC/TiCN/TIN/Al203
16
Example Flat glasses Infra red filter self
cleaning layer- TC0 Example Bio material Low
friction coefficient combined with
body compatibilty Example Nuclear Neutron
caption, fission element trapping Example
Space Space mirror, heat shield
17
Example Aircraft, launcher C/C for brake pad,
random, C/SiC composite Example Infra red
vision ZnS dome for laser guiding Other examples
Solar cell, nano materials
18
MPA Indutrie force According to a large
expérience and technology mastering, the compagny
is able to respond to any customer
requirements. MPA Industrie strategy is To
develop partnership with end users
19
And to become a major actor in the CVD
technologies to develop special collaboration
with abroad countries (EEC, India, China, USA,
Brazil).
20
RELEVANT REFERENCES
21
ORGANIZATION
22
Sylvain Bentivegna, CEO, managing director.
Masters degree in physical engineering from
ENSEA (French national graduate school in
electronic engineering). Euring tittle. He set
up the compagny in 1992 Plasma and thermical
expertize Contribute to reactor design for
process development for a wide range of
materials and applications PACVD CVD - CVI
consultancy EEC expert
23
ZA Est du Puits de la chaux BP 18 France 42650
Saint Jean Bonnefonds Contact_at_mpa.fr