IEC SC86CWG3 Meeting Report for TIA

1
IEC SC86C/WG3 Meeting Report for TIA
FO211-2001-06-TD03

• Diane Williams
• June 25, 2001

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IEC WG3 Meeting Details

• Last meeting held in Anaheim, CA - March 15 16,
  2001
• 18 attendees from 13 different companies
• Companies present Agilent, Alcatel
  Optronics,Corning, EXFO, Furukawa, Iphotonics,
  NEC, NIST, Nortel, NTT, Pirelli, Symmorphix and
  Telecom Italia Lab
• Next WG3 meeting October 8-9, 2001 in Florence,
  Italy (week before Plenary meeting)
• Joint SC86C Meeting Includes WG1, WG3 and WG3
  meeting on Oct. 10th

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IEC WG3 Meeting Highlights

• Reliability Standard for OAs (61291-5-2)
  completed CDV stage (April)
• Technical report on OA classification/applications
  (61292-3) moving to CDV stage
• JME PMD document on OAs (61290-11-1) in progress
  (moving to CDV stage)
• Standard using Stokes Parameter Analysis for PMD
  under consideration
• Draft reviewed for Interpolated Source
  Subtraction (ISS) test method for gain and NF
  measurements (NP)

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IEC WG3 Meeting Highlights (continued)

• NIST reviewed RIN calibration standard and
  application to improve accuracy of electrical
  test methods for NF measurements
• WG3 working with SC100D(SC on cabled distribution
  systems) to ensure consistency in use of OA
  terminology
• IEC Performance Standard for OAs on hold