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The Birck Nanotechnology Center

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Title: The Birck Nanotechnology Center


1
The Birck Nanotechnology Center
2
The Birck Nanotechnology CenterSpecifically
Designed for Interdisciplinary Collaborative
Research in Nanotechnology
3
Birck Nanotechnology CenterFacility
  • Laboratories
  • Cleanroom
  • Offices
  • Conferencing and Collaborating Areas

4
First Floor Block Diagram
5
First Floor Block Diagram
6
First Floor Block Diagram
7
First Floor Block Diagram
Atomic Force Microscopy
8
First Floor Block Diagram
Surface Analysis
9
Second Floor Block Diagram
10
Second Floor Block Diagram
11
Second Floor Block Diagram
12
Second Floor Block Diagram
13
Second Floor Block Diagram
14
Second Floor Block Diagram
15
Second Floor Block Diagram
16
Laboratories
  • Modular System
  • 88 modules
  • 11 x 22
  • Laboratories consist of various numbers of
    modules, from 1 to 7

A Single-Module Laboratory
A Three-Module Laboratory
A Five-Module Laboratory
17
Laboratories
  • Isolated vibration slab (first floor)
  • Meets NIST-A Standard
  • EMI Control
  • 0.1 milligauss in sweet spots in each
    laboratory
  • Temperature Control
  • 1.0 degree Celsius
  • 0.1 degree control in STEM laboratory

18
Kevin G. Hall Nanometrology Laboratory
  • Vibration control below NIST A-1 standard
  • EMI below 0.1 milliGauss
  • Temperature control of 0.01 degree C

19
Service Galleys
  • Laboratories are supported by a service galley
    located behind the laboratory
  • Service galley furnishes utilities to each wing
  • Galleys also contain chillers, pumps, etc.
    (vibration, noise)

20
Utility Distribution
  • Standard Utilities
  • Clean power, standard power, instrument ground
  • Ultrapure water
  • Process vacuum
  • Bulk gases Nitrogen, Oxygen, Helium, Hydrogen
  • Cooling water
  • Optional Utilities (as needed)
  • Higher voltages and currents
  • Specialty gases Inerts, toxics, flammables,
    pyrophorics

21
Ultrapure Water System
  • Water specifications
  • 1 part per billion Dissolved Oxygen
  • lt225 parts per trillion Total Oxidizable Carbon
    (TOC)
  • lt15 parts per trillion Boron
  • System Volume
  • 12,000 gallons per day make-up
  • 100 gallons per minute recirculation
  • Distribution System
  • PVDF piping
  • High turbulence design
  • Zero-stat valves

22
Typical Laboratory Wing
23
Laboratory Equipment
  • AFM, STM, Surface Analysis
  • SEM, FIB, and TEM
  • Laser Systems
  • Biological and MEMS devicefabrication
  • MOCVD, PECVD, MBE
  • Carbon nanotube growth

24
Collaborative Research with Bindley Biosciences
Center
  • BNC biological laboratories located on east end
    of facility
  • BindleyBiosciences Center is located just east
    of the BNC
  • A walkway connects the two facilities

25
Cleanroom
  • 25,252 square feet
  • Nanofabrication cleanroom coupled with a
    pharmaceutical grade cleanroom
  • Material access between cleanrooms

26
Nanofabrication Cleanroom
  • Three Levels
  • Full Subfab
  • Cleanroom
  • Air Handling
  • Cleanroom
  • Bay-Chase design
  • Raised floor
  • Bulkhead-Mounted Equipment

27
The Subfab
28
Bay-Chase Design
  • Provides segregation of maintenance and
    operations functions
  • Fewer rules physical barrier instead
  • Lower cost approach
  • Less first cost
  • Less operating cost
  • Approaches minienvironment cleanliness with less
    cost and fewer restrictions

29
Raised Floor
30
Nanofabrication Cleanroom
  • ISO Class 3 (Class 1)
  • 6 bays
  • ISO Class 4 (Class 10)
  • 5 bays
  • ISO Class 5 (Class 100)
  • 2 bays

31
Capability to Upgrade Cleanliness
  • Capability for adding additional airflow
  • Improving cleanroom cleanliness
  • Adding cleanroom floorspace (reducing chase area)
  • Requires three components
  • Area for additional air handlers
  • Space for additional ductwork
  • Modular ceiling system

32
Nanofabrication Cleanroom
  • Below NIST A Vibration Levels
  • Temperature control
  • 1.0 degree Celsius
  • 0.1 degree in e-beam lithography bay
  • Humidity Control
  • 45 5 Relative

33
Cleanroom Layout
34
Cleanroom Section
35
Biocleanroom
  • Below NIST A Vibration Levels
  • Temperature control
  • 1.0 degree Celsius
  • Pharmaceutical grade design

36
Biocleanroom Section
37
Offices, Conference Rooms, and Collaboration Areas
  • 73 Offices
  • 11 Conference Rooms
  • Library
  • Kitchenette
  • Informal Gathering Areas with white boards

38
  • Laboratory Cleanroom Equipment

39
Equipment Categories
  • Atomic Force Microscopy
  • Surface Analysis
  • Electron Microscopy
  • Analytical Systems
  • Laser Systems
  • Crystal Growth
  • BSL-1 and BSL-2 Biological Laboratories
  • Electrical Characterization

40
Equipment Categories (CONTINUED)
  • Lithography and Maskmaking
  • Dry Etching and Cleaning
  • Metal Deposition
  • Other Deposition Equipment
  • Thermal Processing
  • Wet Etching and Cleaning
  • Other Systems

41
Atomic Force Microscopy
  • Laboratories
  • Molecular Imaging AFM
  • Haptic AFM
  • DI 3100 AFM (2)
  • Asylum Research 3-D Atomic Force Microscope
  • Veeco Atomic Force Microscope
  • Bio-Scope II AFM (Bindley Bioscience Center)
  • Cleanroom
  • Veeco Atomic Force Microscope (AFM)

42
Surface Analysis
  • Omicron Multi-Technique Surface Analysis Cluster
    Tool
  • High-Resolution Electron Energy Loss Spectrometer
    (EELS)
  • Scanning Electron Microscope (SEM)
  • Hemispherical Electron Spectrometer for XPS, AES,
    UPS, ISS
  • Scanning Auger Spectrometer
  • Focused Ion Beam (FIB)
  • All interconnected under high vacuum
  • Kratos Imaging X-Ray Photoemission Spectrometer
    (XPS)
  • Omicron Ultra-High Vacuum (UHV) Scanning
    Tunneling Microscope (STM)

43
Electron Microscopy
  • Titan 80-300 keV Field-Emission TEM
  • Environmental Transmission Electron Microscope
  • Scanning Transmission Electron Microscope
  • Manufactured by FEI Corporation
  • H4700 Field-Emission SEM
  • Manufactured by Hitachi Corporation
  • NovaLab FIB/SEM
  • Focused Ion Beam
  • Scanning Electron Microscope
  • Manufactured by FEI Corporation

44
Analytical Systems
  • X-Ray Diffraction System
  • Near-Field Scanning Optical Microscope (NSOM)
  • Near-Field Scanning Optical Microscope
  • Spectrophotometer
  • Fourier Transform Infrared Spectrometer
  • Dynamic Light Scattering Apparatus
  • Ellipsometer
  • Langmuir-Blodgett Apparatus
  • Mass Spectrometer

45
Laser Systems
  • Pulsed Laser Deposition System
  • Photoluminescence System
  • Laser-Based Microfluidic Analysis System
  • Laser-Based Nanolithography System
  • Free-Space Laser
  • Interference Lithography System

46
Crystal Growth and Deposition Systems
  • Varian Gen-II Molecular Beam Epitaxy (MBE) System
  • Aixtron AIX 200/4 Metal-Organic Chemical Vapor
    Deposition (MOCVD) System
  • Epigress VP-508 Horizontal Hot-Wall CVD Reactor
  • Halide Vapor-Phase Epitaxy (HVPE) System
  • Plasma-Enhanced Chemical Vapor Deposition (PECVD)
    System
  • Field-Emission Vacuum System

47
BSL-2 Laboratories
  • Micromanipulator Probe Stations (2)
  • Bio-Safety-Level 2 Cabinets (2)
  • Sample Glove Boxes (2)
  • Fluorescence Microscopes (2)
  • Laser Doppler Vibrometer
  • Autoclave
  • Bio-Safety-Level 2 Cabinets (2)
  • Sample Freezers (2)
  • Sample Refrigerators (2)
  • Cell Culture Rooms (2)

48
BSL-1 Laboratories
  • Critical Point Dryer
  • Micromanipulator Probe Station
  • Optical Table
  • Stereolithography
  • Lab 2081
  • Equipment
  • Micromanipulator Probe Stations (2)
  • Atomic Force Microscope
  • Sample Refrigerator
  • Quartz Crystal Microbalance
  • Surface Plasmon Resonance

49
Electrical Characterization
  • Shielded Micromanipulator Probe Stations (6)
  • HP 4156A Semiconductor Parameter Analyzers (2)
  • HP 4284A LCR Meters
  • Keithley Hi-Lo Capacitance System
  • HP 4140B Picoammeter
  • Tektronix 371A High-Voltage Curver Tracer
  • Etc...
  • Low-Temperature Probe Station
  • Mercury Probe
  • Hall Measurement Systems (3)
  • Cascade Probe Station
  • HP 8505A Network Analyzer
  • HP 851B Spectrum Analyzer
  • Tektronix 2755 Spectrum Analyzer
  • HP 8503A S-Parameter Test Set

50
Lithography
  • Vistec (formerly Leica) VB-6 Ultra-High
    Resolution, Extra-Wide Field Electron Beam
    Lithography Tool, Capable of 6 nm Resolution in
    Resist
  • Raith Electron Beam Lithography Tool and
    Nanotechnology Work Station
  • Optical Photomask Aligner and Exposure Systems
  • Canon PLA-501F
  • Karl Suss MJB-3 (2)
  • Karl Suss MABA-6
  • Karl Suss MA-25 Double-Sided Optical Photomask
    Aligner and Exposure System
  • Karl Suss SB-6E Wafer Bonding System
  • Photoresist Application and Development Spinners
  • Interference Lithography System

51
Lithography - Maskmaking
  • TRE Electromask Pattern Generator (2)
  • Photoresist Application and Development Spinners
  • YES Image Reversal System
  • APT Automated Plate Processor

52
Dry Etching and Cleaning
  • Panasonic Deep Reactive Ion Etcher
  • Capable of Fluorine and Chlorine etch chemistries
  • STS Deep Reactive Ion Etch (RIE) Systems (2)
  • Anisotropic Silicon Etcher
  • Anisotropic Oxide Etcher
  • Drytek Triode RIE
  • PlasmaLab RIE
  • XeF2 Etching System
  • UV-Ozone Cleaner
  • Branson Plasma Asher

53
Metal Deposition
  • Kurt J. Lesker electron-beam evaporator
  • Airco-Temescal FDC-1800 e-beam evaporator
  • Varian e-beam evaporator
  • Leybold e-beam evaporator
  • CHA e-beam evaporator
  • Perkin-Elmer e-beam evaporator
  • Veeco 7760 thermal evaporator
  • Perkin-Elmer 2400 sputterer

54
Deposition Systems
  • AXIC PECVD System
  • LPCVD Furnace System
  • Low-Temperature Oxide (LTO) Deposition System
  • F-120 Atomic Layer Deposition (ALD) System
  • F-450 Atomic Layer Deposition (ALD) System

55
Thermal Processing
  • Rapid Thermal Processing
  • Wet and dry oxidation
  • Pyrogenic Oxidation System
  • Blue-M Oxidation Furnace
  • Lindberg Oxidation Furnace
  • Nitric Oxide Annealer

56
Wet Etching and Cleaning
  • Laboratories
  • Dual-purpose acid/solvent fume hoods (30)
  • Must be designated acid or solvent
  • Dual-function fume hood for acids and solvents
    (2)
  • Cleanroom
  • Acid fume hoods (4)
  • Solvent fume hoods (8)
  • Dual-function fume hood for acids and solvents (2)

57
Other Systems
  • Laboratories
  • Chemical-Mechanical Polish (CMP) system
  • Bonding
  • Wire
  • Ribbon
  • Ball
  • Dicing Saw

58
Summary
  • 22,000 square feet of laboratory space and an
    extensive equipment set provide extraordinary
    capabilities
  • 25,000 square feet of cleanroom space and a wide
    variety of equipment support diverse research
    needs
  • The entire set of resources provided by this
    186,000 square foot facility are designed to
    support collaborative interdisciplinary research
    in nanotechnology

59
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