Title: The Birck Nanotechnology Center
1The Birck Nanotechnology Center
2The Birck Nanotechnology CenterSpecifically
Designed for Interdisciplinary Collaborative
Research in Nanotechnology
3Birck Nanotechnology CenterFacility
- Laboratories
- Cleanroom
- Offices
- Conferencing and Collaborating Areas
4First Floor Block Diagram
5First Floor Block Diagram
6First Floor Block Diagram
7First Floor Block Diagram
Atomic Force Microscopy
8First Floor Block Diagram
Surface Analysis
9Second Floor Block Diagram
10Second Floor Block Diagram
11Second Floor Block Diagram
12Second Floor Block Diagram
13Second Floor Block Diagram
14Second Floor Block Diagram
15Second Floor Block Diagram
16Laboratories
- Modular System
- 88 modules
- 11 x 22
- Laboratories consist of various numbers of
modules, from 1 to 7
A Single-Module Laboratory
A Three-Module Laboratory
A Five-Module Laboratory
17Laboratories
- Isolated vibration slab (first floor)
- Meets NIST-A Standard
- EMI Control
- 0.1 milligauss in sweet spots in each
laboratory - Temperature Control
- 1.0 degree Celsius
- 0.1 degree control in STEM laboratory
18Kevin G. Hall Nanometrology Laboratory
- Vibration control below NIST A-1 standard
- EMI below 0.1 milliGauss
- Temperature control of 0.01 degree C
19Service Galleys
- Laboratories are supported by a service galley
located behind the laboratory - Service galley furnishes utilities to each wing
- Galleys also contain chillers, pumps, etc.
(vibration, noise)
20Utility Distribution
- Standard Utilities
- Clean power, standard power, instrument ground
- Ultrapure water
- Process vacuum
- Bulk gases Nitrogen, Oxygen, Helium, Hydrogen
- Cooling water
- Optional Utilities (as needed)
- Higher voltages and currents
- Specialty gases Inerts, toxics, flammables,
pyrophorics
21Ultrapure Water System
- Water specifications
- 1 part per billion Dissolved Oxygen
- lt225 parts per trillion Total Oxidizable Carbon
(TOC) - lt15 parts per trillion Boron
- System Volume
- 12,000 gallons per day make-up
- 100 gallons per minute recirculation
- Distribution System
- PVDF piping
- High turbulence design
- Zero-stat valves
22Typical Laboratory Wing
23Laboratory Equipment
- AFM, STM, Surface Analysis
- SEM, FIB, and TEM
- Laser Systems
- Biological and MEMS devicefabrication
- MOCVD, PECVD, MBE
- Carbon nanotube growth
24Collaborative Research with Bindley Biosciences
Center
- BNC biological laboratories located on east end
of facility - BindleyBiosciences Center is located just east
of the BNC - A walkway connects the two facilities
25Cleanroom
- 25,252 square feet
- Nanofabrication cleanroom coupled with a
pharmaceutical grade cleanroom - Material access between cleanrooms
26 Nanofabrication Cleanroom
- Three Levels
- Full Subfab
- Cleanroom
- Air Handling
- Cleanroom
- Bay-Chase design
- Raised floor
- Bulkhead-Mounted Equipment
27The Subfab
28Bay-Chase Design
- Provides segregation of maintenance and
operations functions - Fewer rules physical barrier instead
- Lower cost approach
- Less first cost
- Less operating cost
- Approaches minienvironment cleanliness with less
cost and fewer restrictions
29Raised Floor
30Nanofabrication Cleanroom
- ISO Class 3 (Class 1)
- 6 bays
- ISO Class 4 (Class 10)
- 5 bays
- ISO Class 5 (Class 100)
- 2 bays
31Capability to Upgrade Cleanliness
- Capability for adding additional airflow
- Improving cleanroom cleanliness
- Adding cleanroom floorspace (reducing chase area)
- Requires three components
- Area for additional air handlers
- Space for additional ductwork
- Modular ceiling system
32Nanofabrication Cleanroom
- Below NIST A Vibration Levels
- Temperature control
- 1.0 degree Celsius
- 0.1 degree in e-beam lithography bay
- Humidity Control
- 45 5 Relative
33Cleanroom Layout
34Cleanroom Section
35Biocleanroom
- Below NIST A Vibration Levels
- Temperature control
- 1.0 degree Celsius
- Pharmaceutical grade design
36Biocleanroom Section
37Offices, Conference Rooms, and Collaboration Areas
- 73 Offices
- 11 Conference Rooms
- Library
- Kitchenette
- Informal Gathering Areas with white boards
38- Laboratory Cleanroom Equipment
39Equipment Categories
- Atomic Force Microscopy
- Surface Analysis
- Electron Microscopy
- Analytical Systems
- Laser Systems
- Crystal Growth
- BSL-1 and BSL-2 Biological Laboratories
- Electrical Characterization
40Equipment Categories (CONTINUED)
- Lithography and Maskmaking
- Dry Etching and Cleaning
- Metal Deposition
- Other Deposition Equipment
- Thermal Processing
- Wet Etching and Cleaning
- Other Systems
41Atomic Force Microscopy
- Laboratories
- Molecular Imaging AFM
- Haptic AFM
- DI 3100 AFM (2)
- Asylum Research 3-D Atomic Force Microscope
- Veeco Atomic Force Microscope
- Bio-Scope II AFM (Bindley Bioscience Center)
- Cleanroom
- Veeco Atomic Force Microscope (AFM)
42Surface Analysis
- Omicron Multi-Technique Surface Analysis Cluster
Tool - High-Resolution Electron Energy Loss Spectrometer
(EELS) - Scanning Electron Microscope (SEM)
- Hemispherical Electron Spectrometer for XPS, AES,
UPS, ISS - Scanning Auger Spectrometer
- Focused Ion Beam (FIB)
- All interconnected under high vacuum
- Kratos Imaging X-Ray Photoemission Spectrometer
(XPS) - Omicron Ultra-High Vacuum (UHV) Scanning
Tunneling Microscope (STM)
43Electron Microscopy
- Titan 80-300 keV Field-Emission TEM
- Environmental Transmission Electron Microscope
- Scanning Transmission Electron Microscope
- Manufactured by FEI Corporation
- H4700 Field-Emission SEM
- Manufactured by Hitachi Corporation
- NovaLab FIB/SEM
- Focused Ion Beam
- Scanning Electron Microscope
- Manufactured by FEI Corporation
44Analytical Systems
- X-Ray Diffraction System
- Near-Field Scanning Optical Microscope (NSOM)
- Near-Field Scanning Optical Microscope
- Spectrophotometer
- Fourier Transform Infrared Spectrometer
- Dynamic Light Scattering Apparatus
- Ellipsometer
- Langmuir-Blodgett Apparatus
- Mass Spectrometer
45Laser Systems
- Pulsed Laser Deposition System
- Photoluminescence System
- Laser-Based Microfluidic Analysis System
- Laser-Based Nanolithography System
- Free-Space Laser
- Interference Lithography System
46Crystal Growth and Deposition Systems
- Varian Gen-II Molecular Beam Epitaxy (MBE) System
- Aixtron AIX 200/4 Metal-Organic Chemical Vapor
Deposition (MOCVD) System - Epigress VP-508 Horizontal Hot-Wall CVD Reactor
- Halide Vapor-Phase Epitaxy (HVPE) System
- Plasma-Enhanced Chemical Vapor Deposition (PECVD)
System - Field-Emission Vacuum System
47BSL-2 Laboratories
- Micromanipulator Probe Stations (2)
- Bio-Safety-Level 2 Cabinets (2)
- Sample Glove Boxes (2)
- Fluorescence Microscopes (2)
- Laser Doppler Vibrometer
- Autoclave
- Bio-Safety-Level 2 Cabinets (2)
- Sample Freezers (2)
- Sample Refrigerators (2)
- Cell Culture Rooms (2)
48BSL-1 Laboratories
- Critical Point Dryer
- Micromanipulator Probe Station
- Optical Table
- Stereolithography
- Lab 2081
- Equipment
- Micromanipulator Probe Stations (2)
- Atomic Force Microscope
- Sample Refrigerator
- Quartz Crystal Microbalance
- Surface Plasmon Resonance
49Electrical Characterization
- Shielded Micromanipulator Probe Stations (6)
- HP 4156A Semiconductor Parameter Analyzers (2)
- HP 4284A LCR Meters
- Keithley Hi-Lo Capacitance System
- HP 4140B Picoammeter
- Tektronix 371A High-Voltage Curver Tracer
- Etc...
- Low-Temperature Probe Station
- Mercury Probe
- Hall Measurement Systems (3)
- Cascade Probe Station
- HP 8505A Network Analyzer
- HP 851B Spectrum Analyzer
- Tektronix 2755 Spectrum Analyzer
- HP 8503A S-Parameter Test Set
50Lithography
- Vistec (formerly Leica) VB-6 Ultra-High
Resolution, Extra-Wide Field Electron Beam
Lithography Tool, Capable of 6 nm Resolution in
Resist - Raith Electron Beam Lithography Tool and
Nanotechnology Work Station - Optical Photomask Aligner and Exposure Systems
- Canon PLA-501F
- Karl Suss MJB-3 (2)
- Karl Suss MABA-6
- Karl Suss MA-25 Double-Sided Optical Photomask
Aligner and Exposure System - Karl Suss SB-6E Wafer Bonding System
- Photoresist Application and Development Spinners
- Interference Lithography System
51Lithography - Maskmaking
- TRE Electromask Pattern Generator (2)
- Photoresist Application and Development Spinners
- YES Image Reversal System
- APT Automated Plate Processor
52Dry Etching and Cleaning
- Panasonic Deep Reactive Ion Etcher
- Capable of Fluorine and Chlorine etch chemistries
- STS Deep Reactive Ion Etch (RIE) Systems (2)
- Anisotropic Silicon Etcher
- Anisotropic Oxide Etcher
- Drytek Triode RIE
- PlasmaLab RIE
- XeF2 Etching System
- UV-Ozone Cleaner
- Branson Plasma Asher
53Metal Deposition
- Kurt J. Lesker electron-beam evaporator
- Airco-Temescal FDC-1800 e-beam evaporator
- Varian e-beam evaporator
- Leybold e-beam evaporator
- CHA e-beam evaporator
- Perkin-Elmer e-beam evaporator
- Veeco 7760 thermal evaporator
- Perkin-Elmer 2400 sputterer
54Deposition Systems
- AXIC PECVD System
- LPCVD Furnace System
- Low-Temperature Oxide (LTO) Deposition System
- F-120 Atomic Layer Deposition (ALD) System
- F-450 Atomic Layer Deposition (ALD) System
55Thermal Processing
- Rapid Thermal Processing
- Wet and dry oxidation
- Pyrogenic Oxidation System
- Blue-M Oxidation Furnace
- Lindberg Oxidation Furnace
- Nitric Oxide Annealer
56Wet Etching and Cleaning
- Laboratories
- Dual-purpose acid/solvent fume hoods (30)
- Must be designated acid or solvent
- Dual-function fume hood for acids and solvents
(2) - Cleanroom
- Acid fume hoods (4)
- Solvent fume hoods (8)
- Dual-function fume hood for acids and solvents (2)
57Other Systems
- Laboratories
- Chemical-Mechanical Polish (CMP) system
- Bonding
- Wire
- Ribbon
- Ball
- Dicing Saw
58Summary
- 22,000 square feet of laboratory space and an
extensive equipment set provide extraordinary
capabilities - 25,000 square feet of cleanroom space and a wide
variety of equipment support diverse research
needs - The entire set of resources provided by this
186,000 square foot facility are designed to
support collaborative interdisciplinary research
in nanotechnology
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