UV2litho

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UV2litho

• Project Presentation

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Project objectives
Accelerate the development of 157nm
manufacturable lithography process for the 70nm
node

• Key objectives
• Provide feed-back to resist and mask suppliers
  to guide their development for 157nm
• Provide metrology solutions for the 70nm node
• Provide resist solutions for 157nm production
  scanner
• Demonstrate 157nm resist solutions on the
  critical layers for the 70nm node

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Methodology

• Methodology
• The objectives will be met by establishing a
  157nm infrastrucure at IMEC based on a 0.75 NA
  scanner interfaced to a TEL ACT8 track and
  supported by metrology equipment.
• Project structure

Start date September 1, 2001Duration 36 months
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Consortium and resources

• IMEC (Belgium)
• ASM Lithography (The Netherlands)
• Philips Innovations Technology Solutions (PITS)
  (Belgium)
• ST Microelectronics SA (France)
• Infineon Technologies AG (Germany)
• Laboratoire des Technologies de la
  Microélectronique CNRS (CNRS-LTM) (France)
• ST Microelectronics S.r.l. (Italy)

Total budget 10.412.991 Community funding (EU
IST Programme) 3.888.500 
Contact info Dr. Mieke Goethals Goethals_at_imec.beI
MEC - SPT- Litho tel [phone]Kapeldreef
75 fax [phone]B-3001 Leuven (Belgium)