... 5Clariant Corporation Synthesis and Properties of Noval Fluoropolymer for 157nm Photoresists by Cyclo-polymerization Osamu Yokokoji1, Shun-ichi Kodama1 ...
Usable Vacuum Ultra Violet Lithography. IST-2000-30175 UV2Litho. Key Action IV.8.2 ... Provide feed-back to resist and mask suppliers to guide their development ...