Subproject: MATERIALS

1
Subproject MATERIALS The subproject MATERIALS
deals with the development of new polymers
suiting the needs of nanoimprint lithography.
Only the application of polymers, specially
designed for those processes, allows to fully
exploit the whole potential for emerging
technology. Related to the thermoplastic
materials, this subproject is focused on the
development of new polymers (or copolymers)
surpassing the properties of the currently used
polymers (related to thermal/ optical/ flow
behaviour, biocompatibility, hydrophobicity, and
others). On the other hand, new curing polymers
offer a chance of nanoimprinting at low
temperature and short cycle times. The
incorporation of colloidal nanocrystals
(semiconductor, oxide or metal), with size
dependent optical and electronic properties in
the polymer matrix allows to add new
functionalities to thermoplastic materials
towards permanent applications.
NIL polymers developed in the subproject mr-I
7000E Thermoplastic, Tg 60 ºC. For pattern
tansfer. mr-I 8000E Thermoplastic, Tg 115 ºC.
Improved imprint behaviour, high plasma etch
resistance. For pattern transfer. mr-I T85
Thermoplastic, Tg 85 ºC. For pattern transfer
optical applications. mr-NIL 6000
Photochemically curing polymer, Tg 40 ºC. For
pattern transfer permanent applications. Thermop
lastic, Tg 80 ºC For nanopatterning of optically
active nanocomposites. Thermoplastic, Tg 108 ºC
Functionalized polymer for nanopatterning of
biomolecules. already commercially available
Waveguide imprinted in luminescent NC doped PMMA
For more information, please contact Gabi
Gruetzner or Freimut Reuther, from mrt
(www.microresist.de)