Title: MAI Lab
1??? ?? ??
2002 . 8 . 16
MAI Lab
? ? ?
MAI Lab Seminar
2Contents
1. ??? ?? ?? (Overview)
2. ????? ??
3. ?? ?? ? ??
4. ?? ? ??
MAI Lab Seminar
3MAI Lab Seminar
4Overview
Logic Design
Wafer Preparation
Circuit Design
Mask(Reticle)
Wafer Fabrication
Assembly
Test
5Overview
FAB ??
Logic ? ?? ??
Mask ??
??? ??
??? ?? ??
??? ??
6Overview
Oxidation
PR ??
Exposure
Development
Etching
?? ??
Metallization
CVD
Ion ??
7Overview
Test ? ??
Sawing
Chip ??
Wire bonding
molding
Final test
82. ????? ??
MAI Lab Seminar
9Wafer Preparation
- ???? ??
- Dopant ??? ??
- - N-Type 5? ??(P, Sb) ? Dopant? ??, ???? ??
- - P-Type 3? ??(B) ? Dopant? ??, Hole(??) ??
- ???? ??? ??
- - 100
- - 111
- ???? ??? ??
- - 3??, 4??, 5??, 6??(150mm), 8??(200mm),
12??(300mm)
10Wafer Preparation
donor
n-type
acceptor
p-type
11Wafer Preparation
Crystal Growing
???, ?? ??, ???, ?? ??
Slicing
???/???, ???, ???
Cleaning
Edge Profiling
???, ???
Lapping
???/???, ???, ???, ???
Laser Marking
Cleaning
Etching
Cleaning
Heat Treatment
Cleaning
Polishing
???, ???, Damage, ???
Cleaning
Inspection
Packing
12Wafer Preparation
Preparation
Melting
Body growth
Cool-down Ingot removal
Evaluation
13Wafer Preparation
Slicing
Lapping
Etching
Heat Treatment
Polishing
14Wafer Preparation
Epitaxial Processing
Cleaning
Inspection
Packing
15Wafer Preparation
Crystal Growing
Czochralski Method (CZ)
Floating Zone Method (FZ)
16Wafer Preparation
CZ?? ?? silicon ??? ?? ??
Stacking
??? ??? ?? (Crucible Size, ??? ?)
Pump-Down
??? ? ??? (Final Pressure, Leak Rate)
Melting
?? ? ?? (inert gas flow rate, crucible ???)
Dipping
??? ???? ?? (?? ??, Seed/crucible ???)
Necking
???? ?? ???? ?? (Neck ??/??, ????)
Shouldering
Neck???? ?????? ?? (???? ? ?? ??)
Body Growth
??? ??? ?????? ?? (????, ???)
Tailing
???? ?? ???? ?? (?? tail ??, ?? ??)
Cool-Down
???? ?? (?? ??/??)
17Wafer Preparation
grinding ??? ??? ??? ??? ??? ??? ?? ??? ????,
??? ?? ??? ???? ??? ?? ????? ???? ????.
slicing ???? ?????? ???? ????. ??? ???? ????
??? ??? ??? ??? ?? ???? ??? ?? ?? ??? ???? ??.
????? ?? ????? ??? ???? ???? ?? ???? ????.
18Wafer Preparation
lapping ??? ???? ?? ??? ???? ? ??? ???? ????
??? ?? ???? ???? ??? ??? ????. ????? ????? Al2O3
? ????(glycerine)? ?? ???? ??? ????? ?? ??? ????
????.
rounding ???? ???? ?? ???? ??? ???? ?? ????
???? ???? ??? ????? ??? ??? ?? ???? ?? ?? ?????
?? powder? ????.
19Wafer Preparation
etching ? ????? ??? ???? ???? ???? ???? ????
?? ????? ?? ??. ?????? HF-HNO3-CH3 COOH ?? ???
????? ????.
polishing ??? ???? ???? ?? ??? ????? ???? ???
??? ??? ?? CMP? ??. ???? ?? ??? ?? ??? ???? ??
???? ??? ??? ???? ????. ??? ????, ??? ?? ????
???? ??? ?????? ????.
20Wafer Preparation
- Wafer-related Issues
- Wafer Geometry
- ? Flatness, Alignment, Distortion
- Wafer Cleanliness
- ? Defect Density Reduction, Particle Size
Consideration - Surface Chemistry Defects
- ? Oxidation, Metals, Cleaning
- Crystal Defects
- ? Stacking Faults, Dopant Uniformity, Metal
Contamination
21Lithography
Pattern Preparation
Photoresist Coating
Stepper Exposure
Develop Bake
Acid Etch
22Lithography
Positive Resist
SiO2
Resist
SiO2
SiO2
Si
Si
Si
Negative Resist
SiO2
Mask
SiO2
SiO2
Si
Si
Si
23Lithography
Lithographic masking steps to produce Transistor
24Lithography
Resist Processing
Coating Parameter
25Lithography
Classification
- Positive Negative
- g-line (436nm)
?? ???
- i-line (365nm)
- KrF (248nm)
Laser type
- ArF (193nm)
26Lithography
Pattern Preparation
27Lithography
Proximity Contact Lithography
Projection Lithography
illumination light
Condensor lens
illumination light
Mask pattern
mask pattern
Diffracted light
gap
Projection lens
photoresist
q
wafer
Photoresist
Wafer
28Lithography
Conventional mask
PSM(Phase Shift Mask)
E-field at mask
E-field at wafer
Intensity at wafer
phase edge PSM
Alternating PSM
29Lithography
Next Generation of Lithography Technology
Resolution ???, ?? ?? ??
Resolution ??? throughput ?? ??
- E-Beam Directing Lithography
E-beam Mask
Throughput, resolution ???, Mirror ??? ??? (???
?? ??)
??? ?? ??
30Lithography
E-Beam Directing Writing Lithography
Electron source
Illumination lens
1st aperture
Beam blanker
Condensor lens
2nd aperture Cell mask
Beam Deflector
Objective lens
Wafer stage
Very Low throughput issue
31Lithography
Key Technologies of Optical Lithography
32Film Deposition
Deposition Source
For What ?
Definition
- CVD Chemical Vapor Deposition
- ALD Atomic Layer Deposition
- High-k High Dielectric Constant
- Low-k Low Dielectric Constant
- PVD Physical Vapor Deposition (Sputter)
33Film Deposition
CVD Model
PVD Model
ALD Model
34Film Deposition
Deposition Application
- STI (Shallow Trench Isolation)
- ? Junction Isolation
- PMD (Pre Metallization Dielectric)
- ? Wire Cap. Str. Support
- MC (Metal Contact)
- ? Power Supply to Tr Cap.
- IMD (Inter Metal Dielectric)
- ? Wire Support
- Passivation Protect Structure
35Film Deposition
High-k Material
- Dielectric constant gt 15
Low-k Material
- Reduce the Number of Metal Layer
36Metallization
- Metallization Metal interconnection
- Requirements of Interconnect Materials
- low resistivity
- resistance to electromigration
- good adhesion to adjacent layers
- stability of mechanical and electrical
properties - corrosion resistance
- non contaminants to device and equipment
- controllable deposition and patterning methods
37Metallization
MC and Via Structure on Device
38Metallization
Schematic Diagram of Process Feature in DRAM
39Metallization
Schematic Diagram of Process Feature in Logic
Device
40Metallization
Metal Deposition Technology
41Metallization
Schematic Diagram of Sputtering
42Metallization
Schematic Diagram of CVD Chamber
43Metallization
Two Step Al Application (Cold/Hot Deposition)
44Metallization
CVD W Applications
45Metallization
Cu Interconnection
- Good Electromigration Stressmigration
- Fast Diffusion in Si Dielectric
? Need Diffusion Barrier
- Etching Problem (dry etching ???)
? CMP, Damascene ?? ?
46Metallization
Process Sequence of Cu Dual-Damascene
47Cleaning CMP
What is Cleaning ?
- Definition removing of unwanted materials or
- contaminants from wafer
surfaces
- Wafer cleaning steps are the most widely used
and - repeated process steps in manufacturing.
- Increased chip density requires more wafer
cleaning - steps.
Typical Defects
48Cleaning CMP
Requirements for Ultraclean Wafer Surface
- Metallic Contamination Free
- Organic Contamination Free
- Surface Microroughness Free
49Cleaning CMP
General Cleaning Method
Wet Cleaning
Dip
?? ?? ??? ??
Spray
???? wafer? chemical ?? Compact, Safe, Low cost
Chemical? vapor ??
Dry Cleaning
Vapor
Gas? UV? ???? ??? ?? ??
UV excited
Plasma? ???? radical, ??? gas ?? ? ??
Plasma
Brush Cleaning
Roll Brush
????? Post-CMP ??? ?? ?? Particle ??? ??
Spin Scrubbing
?? CVD, Metal Depo ? ??? ??
50Cleaning CMP
What is CMP ?
- Definition
- - Chemical Mechanical Polishing
- - ???? ??? ???? ?? ???? ??? ???
- ???? ???? ??
- CMP? ????
- - wafer carrier, polishing pad, slurry
51Cleaning CMP
CMP? ??? STI ?? ??
Stacked via?? W Etch back? CMP ??? ??
W Etch Back
W CMP
523. ?? ?? ? ??
MAI Lab Seminar
53Trend
54300mm Wafer
- throughput ??
- 2009??? 200mm wafer ??? ??
- ?? ??
- ?? ??
- ?? ?? ?? ?? ? ?? ??
- ? ??? ?? ? ??? ??
554. ?? ? ??
MAI Lab Seminar
56Conclusion Discussion
- ??? ?? ??? ??
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- 1.5 2 ??? ?? ??
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