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OUTLINE

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Lecture #43 OUTLINE Short-channel MOSFET (reprise) SOI technology Reading: Finish Chapter 19.2 Short-Channel MOSFET IDS does not saturate with increasing VDS due to ... – PowerPoint PPT presentation

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Title: OUTLINE


1
Lecture 43
  • OUTLINE
  • Short-channel MOSFET (reprise)
  • SOI technology
  • Reading Finish Chapter 19.2

2
Short-Channel MOSFET
OUTPUT CHARACTERISTICS
TRANSFER CHARACTERISTICS
  • IDS does not saturate with increasing VDS due to
    DIBL, and also channel-length modulation for
    VDSgtVGS-VT

3
Silicon on Insulator (SOI) Technology
TSOI
  • Transistors are fabricated in a thin
    single-crystal Si layer on top of an electrically
    insulating layer of SiO2
  • Simpler device isolation ? savings in circuit
    layout area
  • Low junction capacitances ? faster circuit
    operation
  • Better soft-error immunity
  • No body effect
  • Higher cost

4
Partially Depleted SOI (PD-SOI)
  • Floating body effect (history dependent)
  • When a PD-SOI NMOSFET is in the ON state, at
    moderate-to-high VDS, holes are generated via
    impact ionization near the drain
  • Holes are swept into the neutral body, collecting
    at the source junction
  • The body-source pn junction is forward biased
  • ? VT is lowered ? IDsat increases
  • ? kink in output ID vs. VDS curve

5
Fully Depleted SOI (FD-SOI)
  • No floating body effect!
  • VT is sensitive to SOI film thickness
  • Poorer control of short-channel effects due to
    fringing electric field from drain
  • Elevated S/D contact structure
  • needed to reduce RS, RD
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