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The Plasma Physics and Radiation Technology master programme is

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The Plasma Physics and Radiation Technology master programme is managed by three groups organizing the four main themes: Equilibrium and Transport in Plasmas – PowerPoint PPT presentation

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Title: The Plasma Physics and Radiation Technology master programme is


1
  • The Plasma Physics and Radiation Technology
    master programme is
  • managed by three groups organizing the four main
    themes
  • Equilibrium and Transport in Plasmas
  • (Prof. M.C.M. van de Sanden)
  • Elementary processes in Gasdischarges
  • (Prof. G.M.W. Kroesen)
  • Coherence and Quantum Technology
  • (Prof. K.A.H. van Leeuwen)

2
  • The master track Plasma Physics and Radiation
    Technology
  • The track embraces subjects such as
  • the generation of plasmas (including Nuclear
    Fusion),
  • plasma-surface interaction (e.g. plasma
    deposition, plasma etching, etc.),
  • plasma-accelerators,
  • laser cooling techniques and atomic optics
  • ion beam applications.

An important characteristic of the master track
is the fundamental approach of the themes as well
as the research into new applications of this
broad field of research.
3
optional courses each student has to choose a
well-balanced set of courses to a total of at
least 33 ECTS points (about 11 courses) interdis
ciplinary project of 8 ECTS points (6
weeks) external assignment project of 19 ECTS
points (12 weeks) usually outside
TU/e graduation project of 60 ECTS points (1
year).
General outline of the Master programme General outline of the Master programme General outline of the Master programme General outline of the Master programme
1st year 60 ECTS 11 optional courses 33 ECTS Multidisciplinary project 8 ECTS ExternalAssignment 19 ECTS
2nd year 60 ECTS Graduation project 60 ECTS Graduation project 60 ECTS Graduation project 60 ECTS
4
Master track courses
3P230 Nuclear Fusion N.J. Lopes Cardozo
3P160 Advanced Plasma Physics M.C.M. van de Sanden
3N260 Physics of High Temperature Plasmas T.J. Schep
3P100 Molecular collisons H.C.W. Beijerinck
3P140 Lasers in physical experiments H.C.W. Beijerinck
3P190 Laser cooling theory and experiment E.J.D. Vredenbregt
  Numerical Simulation of Plasmas J.J.A.M. van der Mullen
3P200 Ellipsometry G.M.W. Kroesen
  Gas discharges M. Haverlag
  Kosmophyisics J.J.A.M. van der Mullen
3P110 Introduction to Plasma Physics R.A.H. Engeln
  Plasma processing science and applications W.M.M. Kessels
3P220 Molecuul-oppervlak-interactie en vacuümtechniek M.C.M. van de Sanden
3K100 Optics of charge particles J. Botman
3K110 Physics of Particle accelerators J. Botman
3K120 Nuclear Analysis techniques L. van Ijzendoorn
3K140 Radio-isotopes and ionizing radiation P. Mutsaerts
  Conversion of electron energy to radiation M. van der Wiel
5
The three research programmes Equilibrium and
Transport in Plasmas (Prof. M.C.M. van de
Sanden/Prof. D.C. Schram) Expanding plasmas and
molecule formation Plasma surface interaction
and atomistic simulations Plasma synthesis of
thin films, nanostructures, and devices Nuclear
Fusion (Rijnhuizen) Elementary processes in
Plasmas (Prof. G.M.W. Kroesen) Non-equilibrium
effects Plasma modelling and Self-organisation in
plasmas Lighting, environmental
applications Biomedical Applications Coherence
and Quantum Technology (Prof. K.A.H. van
Leeuwen) Ultrahigh-gradient electron accelerator
concepts Nanostructure fabrication by laser
manipulation Atom optics/atom interferometry with
ultracold atoms Atom traps ultracold plasmas and
BECs
6
Coherence Quantum Technology (CQT)
  • Extreme states of matter Ultra-cold
    ultra-hot, plasmas gases
  • Laser Manipulation of atoms, electrons and ions
  • Atom, electron ion beams for femto-nano
    science engineering.
  • Ultra-Cold Electron Ion Beams
  • Laser cooling trapping
  • Femtosecond (10-15 s) laser physics
  • Ultra-low temperature (0.001 - 10 kelvin)
    plasmas
  • Femtosecond electron microscopy
  • Sub-nanometer ion beam drilling milling.

Edgar Vredenbregt, Jom Luiten, Peter Mutsaers
7
  • Theory of Quantum Gases
  • Atoms trapped in an optical lattice
  • Superfluidity of ultra-cold (nano-kelvin) Fermi
    and Bose gases
  • Quantum Plasmas Beams.

Servaas Kokkelmans
  • Plasma Laser Wakefield Acceleration
  • Tera-watt light bullet laser physics
  • Extreme high-energy-density plasmas
  • Giga-electron-volt acceleration in a few cm.

Seth Brussaard
8
  • Nano Brush
  • Manipulation of atomic beams with light
  • Atom lithography
  • Deposition of magnetic nano-structures.

Ton van leeuwen
9
EPG
  • Elementary Processes in Gas Discharges
  • Staff
  • Prof.dr.ir. G.M.W. Kroesen
  • Prof.dr. J.J.A.M. van der Mullen
  • Dr.ir. W.W. Stoffels
  • Dr.ir. E.M. van Veldhuizen
  • Prof.dr. U. Ebert
  • Prof.dr. M. Haverlag

10
Elementary Processes in Gas Discharges (EPG)
  • Light and photons Efficient lamps and EUV
    sources
  • Environmental technology using plasmas for air
    / water cleaning
  • Biomedical technology sterilisation new
    medical treatments
  • New energy sources hydrogen technology dusty
    plasmas

11
Plasmas Heaven and earth
12
Plasmas in lab and industry (1)
13
Plasmas in lab and industry (2)
14
Science Technology of Plasma Materials
Processing
http//www.phys.tue.nl/pmp
Prof. dr.ir. Richard van de Sanden Dr. Richard
Engeln Dr.ir. Erwin Kessels Dr. Adriana
Creatore (8 postdocs 15 PhD students 8-12
BSc/MSc students 5 technicians)
15
Research activities
Micro- and nano-engineering of functional
materials
Physics and chemistry of plasma materials
processing
Plasma enhanced CVD Dry etching Plasma-assisted
ALD Thin films devices
Plasma chemistry Ion/radical densities/fluxes Ener
gy distribution fcts. Plasma surface interaction
Advanced plasma and surface diagnostics
Ellipsometry Nonlinear surface spectroscopy Novel
surface diagnostics (Laser) based gas phase
diagnostics
16
Research issues Plasma-materials processing
Reactive species created in gas phase
rf plasma
More freedom and larger parameter space
  • Precursors, Material properties
  • Plasma-assisted ALD
  • (conformal TiN diffusion barriers, tunnel
    barriers)

Self-bias/Ion bombardment
  • Etching of high-aspect
  • ratio structures ion/neutral synergism

Low temperatures
  • Compatibility with
  • substrates/devices
  • Manipulation of ion energy distribution function
  • Novel synergistic
  • effects
  • Organic and polymer devices (encapsulation of
    OLEDs)
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