Wafer Manufacturing

1
Wafer Manufacturing
Within each wafer reactor, HCl acid lines (used
for the cleaning process) often run near
electronic control systems. There is a need to
monitor for HCl leakage to protect electronic
equipment from damage. In addition, H2 is used as
a scavenger to remove oxygen and as a carrier for
dopant gases, which is used in the growing of
silicon wafers. This application presents
opportunity for the TS400 and Model S4000C
Intelligent transmitters fitted with Hydrogen
specific combustible gas sensors and splash
guards.
TS400
Exhaust
HCl Acid Line