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APSXFD Automated Etching System

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The manual process is subject to error due to human intervention ... The etcher is free to perform other functions during automated etching ... – PowerPoint PPT presentation

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Title: APSXFD Automated Etching System


1
APS/XFD Automated Etching System
  • Michael Wieczorek, Ruben Khachatryan, Al
    Macrander, Kurt Goetze, and David Kline
  • 7/29/2005

2
Disadvantages of Current Manual Process Used to
Etch Si and Ge X-ray Optics
  • The manual process is subject to error due to
    human intervention
  • Freedom of movement for the individual performing
    manual etching is severely restricted
  • The etcher is subjected to repetitive wrist
    motion for an extended period (typically 12
    minutes or longer)
  • Although the etcher uses PPE, an accident may
    occur in the fume hood subjecting the etcher to
    hazardous chemicals (HNO3 and HF acids)

3
Advantages of An Automated Etching System for
Etching Si and Ge X-ray Optics
  • A computer program accurately controls all
    etching operations from start to finish
  • The etcher is free to perform other functions
    during automated etching
  • Repetitive motion is now performed by a machine,
    and
  • A chemical/mechanical accident will not harm the
    etcher since no part of the body is inside the
    fume hood during automated etching

4
Functionality Features of the Automated Etching
System
  • Equipped with recessed cutouts for accurate
    placement of fluid containers
  • Mechanical components coated with spray-on
    teflon to prevent corrosion
  • Four recipes available to the user that contain
    the settings to perform the etching process at
    different heights, speeds, and durations
  • Calibrate, home, start, pause, resume, and abort
    buttons
  • Calibrate - finds the high / low of the etching
    system (since there is not a feedback encoder on
    the motors, calibrate provides the mechanism for
    finding the x / y limits of the system).
    Calibrate should be the first button depressed
    after a system reboot.
  • Home - places the etching system in a known,
    user-defined home position.
  • Start - begins the etching process given the
    user-specified input for the chemical and water
    positions.
  • Pause - halts the current motion.
  • Resume - resumes operation from being paused.
  • Abort - halts motion immediately.

5
Main (Startup) Window for the Automated Etching
System
6
Setup Window for the Automated Etching System
7
Automated Etching
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