PMR300

1
PMR-300
Advanced Photoresist Stripper for FPD
Photoresist Stripper

• Characteristics

• Rapid removal of bulk photoresist in 120minutes
• No required intermediate solvent rinse such as
  IPA or Methanol
• Excellent capability
• No Metal Damage

• Applications Metal Layer (2-Layer)

Before treatment
After treatment (_at_70?)
Metal ?
PR
Metal ?
Glass
Metal

• Applications Silicone (Active Layer)

Before treatment
After treatment (_at_70?)
PR
a-SiNH
Glass

• Metal Corrosion Dependence on Metal Layers
  Process Time

ppb
lt Process Condition gt ?Test Substrate
Al-Nd,Mo,Cr ?Immersion Temp. 70? ?Immersion
Time 3, 10, 24hr ?Analysis ICP-MS
(HP-7500)
2
PMR-300L
Advanced Photoresist Stripper for OLED
Photoresist Stripper

• Characteristics

• Rapid removal of bulk photoresist in 110minutes
• No required intermediate solvent rinse such as
  IPA or Methanol
• Excellent strip-ability not only photoresist but
  also insulator and separator layer
• Designed for use in both a spray toll or bath
  system

• Applications

• PR

Before treatment
After treatment (_at_50?)
ITO
PR
Glass

• Separator

After treatment (_at_70?)
Before treatment
Separator

• Insulator

After treatment (_at_50?)
Before treatment
Insulator
ITO
Glass
3
PMR-400
Advanced Photoresist Stripper for FPD
Photoresist Stripper Ash / Etch Residue
Remover

• Characteristics

• Rapid removal of bulk photoresist in 520
  minutes
• No required intermediate solvent rinse such as
  IPA or methanol
• Long bath life typically greater than 24 hours
• No metal damage

• Applications

• Poly-Si Layer

Before treatment
After treatment (_at_80?)
PR
Poly-Si

• Lift-Off Nega PR

Before treatment
After treatment (_at_80?)
PR
a-SiNH
Al
Glass

• Metal Etch Rates (Å/min) at 85?