Title: Detector Technologies for an
1Detector Technologies for an All-Semiconductor
Tracker at the sLHC Hartmut F.W.
Sadrozinski SCIPP, UC Santa Cruz
2Divide the sLHC Tracker into 3 radial regions
with 10x fluence increase Fluence is a factor 10
higher than at the same radius in LHC move
systems outward SCT - Straw tubes, Pixels -
SCT, need new Pixels System performance can then
be estimated. Guess at a specification of the
charge needed in the 3 regions
3Required Studies Tracking detector technologies
are limited by radiation The limiting process is
different in the different radial regions This
motivates different studies
4Simple SSD layout at Radius 20 cm 3 cm strip
length vs. 12 for SCT R 50 cm Single layers,
sz ? 1cm 20 single-sided sz ? 1mm Problem Confusion of
stereo assignment Mitigated by length reduction
But strips are much easier to build Explore
availability of p-type substrates No type
inversion Collect electrons Partial depletion
operation Potential for semi-3D?
5SSD technology for radius 20 cm Recent
results from ATLAS SCT beam test illustrates
problem with charge collection after type
inversion in common p-on-n detectors. N-on-p
would provide much more head room in bias
voltage (cheaper than n-in-n ?) But electrons
have larger Lorenz angle (tilt of SSD)
6- Technologies for Inner-most Pixels System
- Limitation Trapping
- 1. Charge Trapping in Si SSD
- Collected Charge Q Qoe(depletion) e(trapping)
- e(depletion) depends on Vbias , Vdep - effective
detector thickness w -
- e(trapping) exp(-tc/ tt),
- tc Collection time
- tt Trapping time
- Trapping time is reduced with radiation damage
- 1/ tt 5(F/1016) ns-1
- (same for electrons and holes, measured up to
1015 cm-2) - tt 1/ F
- tt 0.2ns for F 1016 cm-2
-
72. Charge Collection in Si SSD of thickness
w Assume linear field (Diode case), field at
depth x E(x) Eo Em(x/w) Eo
2Vdep(x/w2) Collection time without
Saturation tc ?dx/v ?dx/(mE(x))
w2/(2mVdep)ln(1R)/(R(x/w)) R determines
the over-depletion R ½(Vbias
Vdep)/Vdep Vdep is approximately proportional to
fluence F Vdep (300um) ? 300V(F/1015), Vdep
(100um) ? 30V(F/1015), tc 1/ F, tt 1/
F ? Without saturation tc/ tt independent of
fluence !
83. Charge Collection in Si including
Saturation Drift velocity saturates at v ? 107
cm/sec for E 5104 V/cm for electrons, v
about 30 -50 lower for holes Thus the
collection time tc depends on the thickness of
the depleted region tc w/v (w/100um) ns,
for heavily damaged detectors (large Vdep and
E) tc ? 1 ns for w 100um Saturation of the
drift velocity -- tc/ tt F tc/ tt 1 for
20 um after F 1016 cm-2 !
94. Charge Collection in Si including Saturation
(Simple spread sheet study, agrees with data,
full simulations and V. Eremin)
10 3-d Detectors
Differ from conventional planar technology, p
and n electrodes are diffused in small holes
along the detector thickness (3-d processing)
Depletion develops laterally (can be 20 to 100
?m) not sensitive to thickness
Depletion
n
n
n
p
p
50-100 ?m
Sherwood Parker et al., Edge-less detectors
n
n
n
Depletion / Collection de-coupled from
Generation Depletion and Drift over short
distance much higher radiation tolerance
11 5. Detector Materials for Pixels for R
12RD Topics P-type substrates work with Japanese
groups/HPK Find radiation source to irradiate
to F 1016 cm-2 Measure trapping on cryogenic
detectors Fabricate 3-D detectors with Japanese
groups/HPK