The epoxy based photoresist SU-8 has quickly become one of the most common ... ability to easily produce high aspect ratio structures with near-UV lithography ...
Title: BioX Project Update BioX IIP Meeting June 22, 2006 Author: Jennifer Blundo Last modified by: y Created Date: 6/22/2006 2:11:49 AM Document presentation format
Fabrication Process PDMS Electrode Array ME342 MEMS Laboratory Jennifer Blundo Gretchen Chua Yong-Lae Park Ali Rastegar Project Goal Current Microscale Devices ...
Karl Suss Aligner. Raith e-beam. Lithography. CEE spinner. Manual load auto dispense ... Hot Vacuum Press. Bonding. Quick Turn. Research and Production Tool ...
All processing takes place in a cleanroom (class 10 requires no more than 10 ... Post exposure bake. Resist develop. Resist hardbake. Figure 5-31 in text ...