Extreme ultraviolet lithography (EUVL) Equipment Market Analysis: By Light Source (Laser pulsed Sn plasma, ArF excimer lasers, Relativistic Vacuum tube free-electron lasers and Synchrotron radiation); By Tools and By end-user - With Forecast (2016-2021). Avail more information from Sample Brochure Get a Copy @ http://www.marketintelreports.com/pdfdownload.php?id=esr0217
Building an Electron Accelerator for Use in a Free-Electron Laser. by Daniel P. Mills ... The electron accelerator is the first step in the free-electron laser system ...
Paper presented at the 31st International Free-Electron Laser Conference ... D. Harder1, W.H. Miner, Jr.2 , J.B. Murphy1, H. Qian1,Y. Shen1, and X. Yang1 ...